Large-scale atomic layer deposition system is a product independently developed by the center (ZL201610314085. X, etc.), which can meet the needs of batch processing of 12-inch (300 mm) silicon wafers and other large parts and nano-film processing requirements. The system has five heatable liquid sources, which can prepare a variety of binary or ternary composite nano-films. The substrate temperature can be heated to 400 ℃, which can meet the needs of various processing technologies. The system adopts PLC fully automatic control, which can be used stably and continuously for a long time.
1. 衬底尺寸：100 - 300 mm；
2. 衬底数量：可批量加工；
3. 衬底温度：25℃ - 400℃; ±0.2℃；
4. 前驱体源：5个液态源，其中可加热源2个；
5. 沉积的均匀性：<±1%；
6. PLC全自动控制。
可应用于微电子、太阳能、光电、光学、防腐等领域。
